An exposure apparatus EX exposes a substrate P by projecting an image of a predetermined pattern through a liquid 1 onto the substrate. The exposure apparatus includes a projection optical system which performs the projection, and a liquid supply mechanism 10 which supplies the liquid onto the substrate...http://www.google.fr/patents/US20050280791?utm_source=gb-gplus-shareBrevet US20050280791 - Exposure apparatus, exposure method, and method for producing device
Exposure apparatus, exposure method, and method for producing device
Numéro de demande: 11/211,749 Numéro de publication: US 2005/0280791 A1 Date de dépôt: 26 août 2005 Brevet délivré: US7268854 ( Date de délivrance 11 sept. 2007)
