An X-ray lithography system for the production of micro-electronic circuits, of the type comprising a mask having detailed circuit patterns thereon which are irradiated by soft X-rays onto a wafer covered with a photosensitive material to replicate the mask patterns, includes an X-ray source spaced from...http://www.google.fr/patents/US4242588?utm_source=gb-gplus-shareBrevet US4242588 - X-ray lithography system having collimating optics
X-ray lithography system having collimating optics
