An apparatus for treating a semiconductor substrate includes a chamber an internal pressure of which can be controlled from a vacuum to the vicinity of an atmospheric pressure, multiple ultraviolet light emitters provided inside the chamber, a heater provided facing and parallel to the emitters inside...http://www.google.fr/patents/US20060165904?utm_source=gb-gplus-shareBrevet US20060165904 - Semiconductor-manufacturing apparatus provided with ultraviolet light-emitting mechanism and method of treating semiconductor substrate using ultraviolet light emission
Semiconductor-manufacturing apparatus provided with ultraviolet light ...
