Substantially uniform deposition of conductive material on a surface of a substrate, which substrate includes a semiconductor wafer, from an electrolyte containing the conductive material can be provided by way of a particular device which includes first and second conductive elements. The first conductive...http://www.google.fr/patents/US7311811?utm_source=gb-gplus-shareBrevet US7311811 - Device providing electrical contact to the surface of a semiconductor workpiece during processing
Device providing electrical contact to the surface of a semiconductor ...
