An apparatus and method for detecting pattern defects and/or particles on the front surface of a semiconductor wafer having repetitive patterns includes a laser for illuminating an area on the front surface with a beam of polarized light. A lens collects light scattered from the area and forms a Fourier...http://www.google.fr/patents/US6879391?utm_source=gb-gplus-shareBrevet US6879391 - Particle detection method and apparatus
