The invention is embodied in a method of operating a plasma etch reactor, consisting of introducing a gas into the reactor which disassociates as a plasma into an etch species which etches oxide films on a work piece in the reactor and a non-etching species combinable with the etch species into an etch-preventing...http://www.google.fr/patents/US5477975?utm_source=gb-gplus-shareBrevet US5477975 - Plasma etch apparatus with heated scavenging surfaces
Plasma etch apparatus with heated scavenging surfaces
