A technique to form a structure with a rough topography (415) in a planarized semiconductor process. The rough topography (415) is formed by creating cored contacts (433). Subsequent process layers may be further stacked on top of the cored contacts in order to augment the nonplanar characteristics of...http://www.google.fr/patents/US5998295?utm_source=gb-gplus-shareBrevet US5998295 - Method of forming a rough region on a substrate
