Provided is a process for lithographically patterning a material on a substrate comprising the steps of (a) depositing a radiation sensitive material on the substrate by chemical vapor deposition; (b) selectively exposing the radiation sensitive material to radiation to form a pattern; and (c) developing...http://www.google.fr/patents/US6946736?utm_source=gb-gplus-shareBrevet US6946736 - Electrical device including dielectric layer formed by direct patterning process
Electrical device including dielectric layer formed by direct patterning process
