A first photosensitive liquid solution is applied to a substrate, patterned through exposure to radiation and development, and annealed to form a desired solid material, such as SrBi.sub.2 Ta.sub.2 O.sub.9, that is incorporated into a component of an integrated circuit Fabrication processes are designed...http://www.google.fr/patents/US6022669?utm_source=gb-gplus-shareBrevet US6022669 - Method of fabricating an integrated circuit using self-patterned thin films
Method of fabricating an integrated circuit using self-patterned thin films
