The invention encompasses semiconductor assemblies that include a semiconductor substrate having a first region and a second region defined therein. A first oxide region is on the substrate and covers the first region of the substrate. The first oxide region has nitrogen provided therein and substantially...http://www.google.fr/patents/US6690046?utm_source=gb-gplus-shareBrevet US6690046 - Semiconductor assemblies, methods of forming structures over semiconductor substrates, and methods of forming transistors associated with semiconductor substrates
Semiconductor assemblies, methods of forming structures over semiconductor ...
