The invention refers to the field of electron beam lithography, in particular to a method for directing an electron beam (6) onto a target position (Z) on the surface of a substrate, the substrate first being placed onto a movable stage (2) and the stage (2) then being displaced stepwise, in the X and/or...http://www.google.fr/patents/US6635884?utm_source=gb-gplus-shareBrevet US6635884 - Method for directing an electron beam onto a target position on a substrate surface
Method for directing an electron beam onto a target position on a substrate ...
