A system and method for determining whether a desired integrated circuit layout can be accurately modeled from a resist model that is calibrated from a mask test pattern. In one embodiment, a chessboard graph is created having horizontal and vertical axes that are assigned two imaging parameters calculated...http://www.google.fr/patents/US7506285?utm_source=gb-gplus-shareBrevet US7506285 - Multi-dimensional analysis for predicting RET model accuracy
Multi-dimensional analysis for predicting RET model accuracy
