A hollow cathode sputtering apparatus and related method for introducing dopants into a sputtered coating is provided. The method utilizes a sputter reactor which includes a cathode channel that allows a gas stream to flow therein and a flow exit end from which gases may flow out of and towards a substrate...http://www.google.fr/patents/US20060118406?utm_source=gb-gplus-shareBrevet US20060118406 - SPUTTERED TRANSPARENT CONDUCTIVE FILMS
