The present invention provides an apparatus and method for protecting a work piece during surface processing. The apparatus employs a protective material to protect a wafer during backside grinding. The apparatus can further include a vacuum chuck that allows the passage of a vacuum signal, a frame holding...http://www.google.fr/patents/US7018268?utm_source=gb-gplus-shareBrevet US7018268 - Protection of work piece during surface processing
Protection of work piece during surface processing
