An apparatus for sputtering material onto a workpiece, composed of: a chamber; a first target disposed in the chamber for sputtering material onto the workpiece; a holder for holding the workpiece in the chamber; a plasma generation area between the target and the holder; a coil for inductively coupling...http://www.google.fr/patents/US6231725?utm_source=gb-gplus-shareBrevet US6231725 - Apparatus for sputtering material onto a workpiece with the aid of a plasma
Apparatus for sputtering material onto a workpiece with the aid of a plasma
