A chemical vapor deposition method of providing a layer of material atop a semiconductor wafer using an organic precursor includes, a) positioning a wafer within a chemical vapor deposition reactor; b) injecting an organic precursor to within the reactor having the wafer positioned therein, and maintaining...http://www.google.fr/patents/US6495457?utm_source=gb-gplus-shareBrevet US6495457 - Method of reducing carbon incorporation into films produced by chemical vapor deposition involving organic precursor compounds
Method of reducing carbon incorporation into films produced by chemical ...
