A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical...http://www.google.fr/patents/US6867844?utm_source=gb-gplus-shareBrevet US6867844 - Immersion photolithography system and method using microchannel nozzles
Immersion photolithography system and method using microchannel nozzles
