A method for cleaning a semiconductor processing component is provided. The process calls for directing a stream of cleaning media at a surface of the component, the cleaning media including zirconia. After cleaning with the cleaning media, frozen CO2 (dry ice) pellets may be directed at the surface...http://www.google.fr/patents/US6554909?utm_source=gb-gplus-shareBrevet US6554909 - Process for cleaning components using cleaning media
Process for cleaning components using cleaning media
