A lithographic apparatus is configured to project a pattern from a patterning device onto a substrate. The apparatus includes a gas purged sealing aperture extending between at least two different zones of the apparatus, and a gas supplier configured to supply the sealing aperture one or more gases selected...http://www.google.fr/patents/US7684012?utm_source=gb-gplus-shareBrevet US7684012 - Lithographic device, device manufacturing method and device manufactured thereby
Lithographic device, device manufacturing method and device manufactured thereby
