The invention uses an ion beam to polish a rotatable substrate from an oblique angle between the horizontal and the center line of the gun to the substrate to upgrade the quality of substrates. Alternatively, the substrates are left in the high vacuum chamber without breaking the vacuum for in-situ deposition...http://www.google.fr/patents/US5529671?utm_source=gb-gplus-shareBrevet US5529671 - Apparatus and method for ion beam polishing and for in-situ ellipsometric deposition of ion beam films
Apparatus and method for ion beam polishing and for in-situ ellipsometric ...
