A resist pattern thickening material comprises a resin, a crosslinking agent and a water-soluble aromatic compound. A resist pattern comprises an upperlayer on an underlayer resist pattern with an etching rate (/s) ratio of the underlayer resist pattern to the upper layer under the same condition of...http://www.google.fr/patents/US20030102285?utm_source=gb-gplus-shareBrevet US20030102285 - Resist pattern thickening material, resist pattern and forming method thereof, and semiconductor device and manufacturing method thereof
Resist pattern thickening material, resist pattern and forming method ...
