An apparatus for forming at least one layer of substantially homogenous material on a substrate comprising: a processing chamber having a substrate support system on which is disposed a wafer; an energy source for providing thermal or a-thermal energy to the chamber; a source of reactants for the chamber;...http://www.google.fr/patents/US6669782?utm_source=gb-gplus-shareBrevet US6669782 - Method and apparatus to control the formation of layers useful in integrated circuits
Method and apparatus to control the formation of layers useful in integrated ...
