A method of manufacturing a monolithic compound semiconductor sensing device includes epitaxially depositing a signal conditioning epitaxy on a substrate surface, providing a well in the signal conditioning circuit and exposing the substrate surface, and epitaxially depositing a sensor within the we...http://www.google.fr/patents/US6579741?utm_source=gb-gplus-shareBrevet US6579741 - Monolithically integrated sensing device and method of manufacture
Monolithically integrated sensing device and method of manufacture
