An object of the present invention is obtaining a semiconductor film with uniform characteristics by improving irradiation variations of the semiconductor film. The irradiation variations are generated due to scanning while irradiating with a linear laser beam of the pulse emission. At a laser crystallization...http://www.google.fr/patents/US7981733?utm_source=gb-gplus-shareBrevet US7981733 - Laser irradiation method, laser irradiation apparatus, and semiconductor device
Laser irradiation method, laser irradiation apparatus, and semiconductor device
