A fabrication method for providing isolation between adjacent regions of an integrated circuit includes providing a guard layer over field edges that are the interfaces between field oxide regions and diffusion regions in which dopant is introduced. The guard layer will inhibit introduction of dopant...http://www.google.fr/patents/US6437379?utm_source=gb-gplus-shareBrevet US6437379 - Integrated circuit device providing isolation between adjacent regions
Integrated circuit device providing isolation between adjacent regions
