A method and structure for an electrode device, whereby a second electrode is deposited on a first electrode such that there is an increase in the capacitive coupling between the pair of conductive electrodes. The electrodes are self-aligning such that the patterning manufacturing process is insensitive...http://www.google.fr/patents/US6768063?utm_source=gb-gplus-shareBrevet US6768063 - Structure and method for shadow mask electrode
