An improved apparatus and method for substrate layer deposition in which substrate layers are grown by carrier gas delivery of sequential pulses of reactants to the substrate surface. At least one of the reactants comprises excited species, e.g., radicals. In a specific embodiment, the apparatus of this...http://www.google.fr/patents/US7141499?utm_source=gb-gplus-shareBrevet US7141499 - Apparatus and method for growth of a thin film
