A photomask producing method according to the present invention segments a parent pattern which is an -magnification of an original pattern which is a -magnification of a circuit pattern into lengthwise and breadthwise, thereby forming parent patterns on data. The parent patterns are written on a substrate...http://www.google.fr/patents/US20020187406?utm_source=gb-gplus-shareBrevet US20020187406 - Photomask producing method and apparatus and device manufacturing method
Photomask producing method and apparatus and device manufacturing method
Numéro de demande: 10/195,425 Numéro de publication: US 2002/0187406 A1 Date de dépôt: 16 juil. 2002 Brevet délivré: US6677088 ( Date de délivrance 13 janv. 2004)
