A method of correction of a mask pattern in which the mask pattern of a photomask to be used in a photolithographic step is deformed so that a transfer image near a desired design pattern is obtained, including an evaluation point arrangement step for arranging a plurality of evaluation points...http://www.google.fr/patents/US5825647?utm_source=gb-gplus-shareBrevet US5825647 - Correction method and correction apparatus of mask pattern
Correction method and correction apparatus of mask pattern
