A film of fluorine-doped silicon glass ("FSG") is exposed to a nitrogen-containing plasma to nitride a portion of the FSG film. In one embodiment, the FSG film is chemically-mechanically polished prior to nitriding. The nitriding process is believed to scavenge moisture and free fluorine from the FSG...http://www.google.fr/patents/US20010033900?utm_source=gb-gplus-shareBrevet US20010033900 - NITROGEN TREATMENT OF POLISHED HALOGEN-DOPED SILICON GLASS
NITROGEN TREATMENT OF POLISHED HALOGEN-DOPED SILICON GLASS
Numéro de demande: 09/337,983 Numéro de publication: US 2001/0033900 A1 Date de dépôt: 22 juin 1999 Brevet délivré: US6413871 ( Date de délivrance 2 juil. 2002)
