A projection exposure apparatus carries out scan exposure with illumination flux of slit(s) by moving a mask and a substrate in a direction of one-dimension at synchronized speeds with each other. The mask is inclined with a predetermined angle relative to the substrate in the direction of one-dimensional...http://www.google.fr/patents/USRE37946?utm_source=gb-gplus-shareBrevet USRE37946 - Exposure method and projection exposure apparatus
