A lithography simulation method includes: taking in design data of a pattern to be formed on a substrate and mask data to prepare a mask pattern used in forming a latent image of the pattern on the substrate by transmission of an energy ray; obtaining the latent image of the pattern by calculation of...http://www.google.fr/patents/US7426712?utm_source=gb-gplus-shareBrevet US7426712 - Lithography simulation method and recording medium
Lithography simulation method and recording medium
