Apparatus for decontaminating certain types of semiconductor wafer handling equipment is disclosed. The apparatus includes a frame having structure for applying decontaminating and electrostatic elimination fluid to handling equipment. It includes a first chamber and a second chamber. The first chamber...http://www.google.fr/patents/US4437479?utm_source=gb-gplus-shareBrevet US4437479 - Decontamination apparatus for semiconductor wafer handling equipment
Decontamination apparatus for semiconductor wafer handling equipment
