The present invention provides a method for planarizing a metal layer, and a method for manufacturing a micro pixel array. The method for planarizing the metal layer, without limitation, may include the steps of forming a metal layer over a photoresist layer, and then planarizing the metal layer using...http://www.google.fr/patents/US7871931?utm_source=gb-gplus-shareBrevet US7871931 - Method for chemical mechanical planarization of a metal layer located over a photoresist layer and a method for manufacturing a micro pixel array using the same
Method for chemical mechanical planarization of a metal layer located over a ...
