Photomask patterns are represented using contours defined by level-set functions. Given target pattern, contours are optimized such that defined photomask, when used in photolithographic process, prints wafer pattern faithful to target pattern. Optimization utilizes “merit function” for encoding...http://www.google.fr/patents/US7124394?utm_source=gb-gplus-shareBrevet US7124394 - Method for time-evolving rectilinear contours representing photo masks
Method for time-evolving rectilinear contours representing photo masks
