A method for exposing a resist layer with regions of photosensitivity to an image in a lithographic process using a high numerical aperture imaging tool. There is employed a substrate having thereover a layer reflective to the imaging tool radiation and a resist layer having a region of photosensitivity...http://www.google.fr/patents/US7470504?utm_source=gb-gplus-shareBrevet US7470504 - Reflective film interface to restore transverse magnetic wave contrast in lithographic processing
Reflective film interface to restore transverse magnetic wave contrast in ...
