A method for fabricating an active matrix substrate is disclosed which includes the following steps: forming an island region of a first semiconductor film on a prescribed insulating substrate; forming a first insulating film and a second semiconductor film on said first insulating film; forming a second...http://www.google.fr/patents/US5008218?utm_source=gb-gplus-shareBrevet US5008218 - Method for fabricating a thin film transistor using a silicide as an etch mask
Method for fabricating a thin film transistor using a silicide as an etch mask
