Cathodic/anodic vacuum arc sources with plasma ion implantation deposition system for depositing high quality thin film coatings of complex compounds on a workpiece. Both cathodic and anodic vacuum arc deposition sources, CAVAD, are used to create a plasma vapor from solid materials composing the cathode...http://www.google.fr/patents/US5580429?utm_source=gb-gplus-shareBrevet US5580429 - Method for the deposition and modification of thin films using a combination of vacuum arcs and plasma immersion ion implantation
Method for the deposition and modification of thin films using a combination ...
