In one embodiment, the present invention includes a method for forming a sacrificial oxide layer on a base layer of a microelectromechanical systems (MEMS) probe, patterning the sacrificial oxide layer to provide a first trench pattern having a substantially rectangular form and a second trench pattern...http://www.google.fr/patents/US7687297?utm_source=gb-gplus-shareBrevet US7687297 - Forming a cantilever assembly for vertical and lateral movement
Forming a cantilever assembly for vertical and lateral movement
