In an endpoint detection method for a process performed in a substrate processing chamber with an energized gas, a process variable of the process is detected. The process variable comprising at least one of (i) a radiation emitted by the energized gas, (ii) a radiation reflected from a substrate in...http://www.google.fr/patents/US6813534?utm_source=gb-gplus-shareBrevet US6813534 - Endpoint detection in substrate fabrication processes
Endpoint detection in substrate fabrication processes
