An overlay vernier pattern for measuring multi-layer overlay alignment accuracy and a method for measuring the same is provided. A distance between a first alignment mark in a first material layer and a second alignment mark in an underlying second material layer is measured, so as to provide an alignment...http://www.google.fr/patents/US7190823?utm_source=gb-gplus-shareBrevet US7190823 - Overlay vernier pattern for measuring multi-layer overlay alignment accuracy and method for measuring the same
Overlay vernier pattern for measuring multi-layer overlay alignment accuracy ...
