Shallow trench isolation is improved by adding sacrificial sidewalls to the nitride mask, which are subsequently removed to allow gap fill oxide material to overlap the edges of the active region, preventing CMP-induced trenching at the edges of the active area. ...http://www.google.fr/patents/US20020086497?utm_source=gb-gplus-shareBrevet US20020086497 - Beaker shape trench with nitride pull-back for STI
Beaker shape trench with nitride pull-back for STI
