Electronic apparatus, systems, and methods include structures having a dielectric layer containing zirconium silicon oxide film. The zirconium silicon oxide film may be disposed in an integrated circuit, as well as in a variety of other electronic devices. Additional apparatus, systems, and methods are...http://www.google.fr/patents/US20080220618?utm_source=gb-gplus-shareBrevet US20080220618 - ZIRCONIUM SILICON OXIDE FILMS
