A phase edge phase shift mask and a fabrication method thereof for enforcing a width of a field gate image located on a field region, which is weakened by a two exposure process, by using a phase shift mask and a trim mask on a semiconductor substrate, and enforcing a width of the field gate image to...http://www.google.fr/patents/US7097949?utm_source=gb-gplus-shareBrevet US7097949 - Phase edge phase shift mask enforcing a width of a field gate image and fabrication method thereof
Phase edge phase shift mask enforcing a width of a field gate image and ...
