The speed of the laser scanned by the scanning means such as a galvanometer mirror or a polygon mirror is not constant in the center portion and in the end portion of the scanning width. As a result, the object, for example an amorphous semiconductor film, is irradiated with the excessive energy and...http://www.google.fr/patents/US20050037552?utm_source=gb-gplus-shareBrevet US20050037552 - Beam irradiation apparatus, beam irradiation method, and method for manufacturing semiconductor device
Beam irradiation apparatus, beam irradiation method, and method for ...
Numéro de demande: 10/820,781 Numéro de publication: US 2005/0037552 A1 Date de dépôt: 9 avr. 2004 Brevet délivré: US7220627 ( Date de délivrance 22 mai 2007)
