Plasma generating devices, systems and processes are provided in which hybrid capacitively coupled plasma (CCP) and inductively coupled plasma (ICP) sources use a plurality of primary plasma generating cells embedded into large area electrode or elsewhere in communication with a plasma processing chamber....http://www.google.fr/patents/US7976674?utm_source=gb-gplus-shareBrevet US7976674 - Embedded multi-inductive large area plasma source
