A method for fabricating an ultra-small electrode or plug contact for use in chalcogenide memory cells specifically, and in semiconductor devices generally, in which disposable spacers are utilized to fabricate ultra-small pores into which the electrodes are formed. The electrodes thus defined have minimum...http://www.google.fr/patents/US6531391?utm_source=gb-gplus-shareBrevet US6531391 - Method of fabricating a conductive path in a semiconductor device
Method of fabricating a conductive path in a semiconductor device
