Processing techniques are disclosed for batch fabrication of microstructures comprising an oxide mask on a substrate with submicron openings formed therein, and microstructures having deep-submicron, high aspect-ratio etched trenches, using conventional optical photolithography. Exemplary high aspect-ratio...http://www.google.fr/patents/US7056757?utm_source=gb-gplus-shareBrevet US7056757 - Methods of forming oxide masks with submicron openings and microstructures formed thereby
Methods of forming oxide masks with submicron openings and microstructures ...
