An exposure apparatus (EX) is an apparatus which exposes a substrate (P) by irradiating exposure light (EL) onto the substrate (P) via a projection optical system (PL) and a liquid (1). The exposure apparatus (EX) has a substrate table (PT) for holding the substrate (P), and a plate member (30) having...http://www.google.fr/patents/US20070242242?utm_source=gb-gplus-shareBrevet US20070242242 - Exposure Apparatus, Exposure Method, Method for Producing Device, and Optical Part
Exposure Apparatus, Exposure Method, Method for Producing Device, and ...
Numéro de demande: 10/581,307 Numéro de publication: US 2007/0242242 A1 Date de dépôt: 3 déc. 2004 Brevet délivré: US8054447 ( Date de délivrance 8 nov. 2011)
