Tantalum aluminum oxynitride high-κ dielectric

m

FORM GATE DIELECTRIC
ON SUBSTRATE

FORM LAYER OF
SUBSTTTUTABLE MATERIAL
ON GATE DIELECTRIC

FORM SOURCE /DRAIN REGIONS

1

FORM LAYER OF GATE MATERIAL ON LAYER OF SUBSTTTUTABLE MATERIAL

SUBSTITUTE GATE MATERIAL FOR LAYER OF SUBSTITUTABLE MATERIAL

m

d.

FORM fflGH-K GATE DIELECTRIC
ON SUBSTRATE

FORM SACRIFICIAL CARBON GATE
ON GATE DIELECTRIC

FORM SACRIFICIAL CARBON SDDEWALL SPACERS
ADJACENT TO SACRIFICIAL CARBON GATE

FORM SOURCE/DRAIN REGIONS

REPLACE SACRIFICIAL CARBON SIDEWALL SPACERS
WITH NON-CARBON SIDEWALL SPACERS

REPLACE SACRIFICIAL CARBON GATE
WITH A DESIRED METAL GATE MATERIAL